Karl Suss MA6 Mask Aligner

Mask aligners are used to transfer patterns on masks onto substrates coated with photoresist.
• Top side and back side alignment
• 350W Hg Arc lamp delivers exposure calibrated and controlled intensities at 365nm and 405nm wavelengths
• Standard (hard) contact and soft contact exposure modes
• Nitrogen purge for negative resist exposure, flushes surfaces between substrate and mask with nitrogen
• CCD and monitor for easy alignment of wafer and mask
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Mask holder sizes:
• 4” square mask for 3” substrates
• 5” square mask for 4” substrates