Karl Suss MJB3 Mask Aligner

Mask aligners are used to transfer patterns on masks on to substrates coated with photoresist.
• 350W Hg Arc lamp delivers exposure set intensities at 365nm and at 405nm wavelengths
• Standard (hard) contact, soft contact, high pressure vacuum exposure modes
• Resolution of 0.6 microns under optimal conditions
• High Precision alignment stage aligns mask and substrate to within 0.1 micron

Mask holder sizes:
• 2.5” square mask with a 1 3/16” exposure area
• 3.5” square mask with a 3” exposure area
• 2.5” square mask with a 2” exposure area
• 2.5” square mask with a 11/16” exposure area
• 4” round mask with a 3” exposure area
• 4” suqare mask with a 3” exposure area
• 3” round mask with a 1” exposure area
• 2.5” round mask with a 1 9/16” exposure area
• 2.5” round mask with a 2” exposure area
Substrate Sizes: 1.5” to 4” diameter